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Open AccessDOI: 10.1007/s40820-025-01933-8Original Research

Surface/Interface Engineering for High-Resolution Micro-/Nano-Photodetectors

Jinlin Chang¹,Ting Liu¹,Xiao Geng¹,Genting Dai¹,Liangliang Yang¹,Mingjun Cheng¹,Linpan Jiang¹,Zhenyuan Sun¹,Jianshe Liu¹,Wei Chen¹

School of Integrated Circuits, Tsinghua University, Beijing 100084, People's Republic of China

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Surface/Interface Engineering for High-Resolution Micro-/Nano-Photodetectors
Graphical Abstract / Figure
Published In
Nano-Micro Letters
Published:January 3, 2026Edition:Vol. 18, Issue 95 • pp. 1-55Citation:Jinlin Chang et al. (2025), Nano-Micro Letters
Impact FactorPeer-Reviewed Core
Source JournalNano-Micro Letters
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Keywords & Index Terms:Surface modification

Key Takeaways & Executive Findings

  • • Surface/interface engineering compensates for defects, adjusts bandgap, and develops novel quantum structures, optimizing photovoltaic units and revolutionizing optoelectronic devices. • The review comprehensively elaborates surface/interface engineering schemes for micro-/nano-photodetectors, covering principles, types, parameters, material selection, and manufacturing techniques. • Surface/interface modification and micro-/nanostructural design significantly enhance the performance of photovoltaic devices. • Surface/interface engineering drives the development of low-dimensional optoelectronic materials and industrialization of flexible optoelectronic devices.
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Abstract

Photodetectors can convert light energy into electrical signals, so are widely used in photovoltaics, photon counting, monitoring, and imaging. Photodetectors are easy to prepare high-resolution photochips because of their small size unit integration. However, these photodetector units often exhibit poor photoelectric performance due to material defects and inadequate structures, which greatly limit the functions of devices. Designing modification strategies and micro-/nanostructures can compensate for defects, adjust the bandgap, and develop novel quantum structures, which consequently optimize photovoltaic units and revolutionize optoelectronic devices. Here, this paper aims to comprehensively elaborate on the surface/interface engineering scheme of micro-/nano-photodetectors. It starts from the fundamentals of photodetectors, such as principles, types, and parameters, and describes the influence of material selection, manufacturing techniques, and post-processing. Then, we analyse in detail the great influence of surface/interface engineering on the performance of photovoltaic devices, including surface/interface modification and micro-/nanostructural design. Finally, the applications and prospects of optoelectronic devices in various fields such as miniaturization of electronic devices, robotics, and human–computer interaction are shown.

1. Introduction

Light is one of the most important media for the transmission of information and energy, which is important for human interaction with the outside world. As a carrier, light transmits the contents of the environment to human beings, thus enabling them to establish an interactive system and make timely responses, which plays an irreplaceable role for humans. Recently, with the development of computers and artificial intelligence, light and artificial light detectors have gradually attracted widespread attention. Light detectors have similar functions to the human eyes and can convert external light information into electrical signals for computer demonstration and storage; they can also convert light energy into electrical energy as an energy converter. Therefore, the development of high-performance retinal-like photodetectors is of great significance for future artificial intelligence, human–computer interaction, and miniaturization of electronic devices.

Micro-/nano-optoelectronic devices are the main aims of photodetector development, which reduce the chip size by shrinking the optoelectronic unit while improving the signal information processing speed. However, the small size of the photodetector unit, especially the corresponding imaging unit, reduces the dynamic range and fill factor of the pixel, which is very unfavourable to the image output. Thus, the development of high-resolution sensors is also very important [1] (it is worth noting that in this paper, the resolution referred to is the lateral or longitudinal resolution based on the physical space, not the optical frequency/wavelength resolution based on the light wave). However, high resolution is very difficult to achieve because it implies more independent units per identical size of the macroscopic device, i.e. the smaller detector unit. This is usually a complex process involving precise regulation of material growth, accurate design of microstructures, innovations in photolithography, optimization of coating technology, and so on. Also, the performance of optoelectronic devices is greatly affected by defects and mismatches. Therefore, the realization of high-resolution micro-/nano-optoelectronic devices still remains a great challenge.

The small size characteristics of micro-/nano-optoelectronic devices are often based on the microscopic surface/interface; therefore, the development of surface/interface engineering is of critical significance for the optimization and innovation of the optoelectronic devices. Surface/interface engineering is mainly divided into two parts: one is surface/interface modification, mainly through chemical solvent treatment or functional group modification, so that the surface passivation or the formation of buffer layer, thus making the heterogeneous interface or the physical/chemical properties...

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Cite This Research Paper
Jinlin Chang, Ting Liu, Xiao Geng, Genting Dai, Liangliang Yang, Mingjun Cheng, Linpan Jiang, Zhenyuan Sun, Jianshe Liu, Wei Chen (2026). Surface/Interface Engineering for High-Resolution Micro-/Nano-Photodetectors. Nano-Micro Letters. https://doi.org/10.1007/s40820-025-01933-8
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Frequently Asked Questions

What is surface/interface engineering in photodetectors?

Surface/interface engineering involves modifying the surfaces and interfaces of photodetector materials to improve performance. It includes techniques like chemical treatment, functional group modification, and nanostructuring to passivate defects, adjust bandgaps, and create novel quantum structures, thereby enhancing device efficiency and functionality.

Why is high-resolution important in micro-/nano-photodetectors?

High-resolution in photodetectors refers to the ability to distinguish fine spatial details, which is crucial for imaging applications. It enables more independent detector units per unit area, leading to sharper images and better performance in fields like artificial intelligence, robotics, and human-computer interaction.

What are the main challenges in developing high-resolution micro-/nano-photodetectors?

Challenges include material defects, inadequate structures, and the complexity of fabricating smaller detector units without compromising performance. Achieving high resolution requires precise material growth, microstructure design, advanced photolithography, and optimized coating techniques, all while managing issues like reduced dynamic range and fill factor.

How does surface/interface engineering improve photodetector performance?

Surface/interface engineering improves performance by compensating for material defects, adjusting bandgaps, and developing quantum structures. This leads to better charge carrier management, reduced recombination, enhanced light absorption, and overall higher efficiency and stability of the photodetectors.

What are the applications of high-resolution micro-/nano-photodetectors?

These photodetectors are used in various fields including photovoltaics, photon counting, monitoring, imaging, miniaturization of electronic devices, robotics, and human-computer interaction. They enable advanced sensing and imaging capabilities essential for modern technology.

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