Key Takeaways & Executive Findings
- •• This review provides a comprehensive exploration of advanced film and patterning fabrication techniques for high-performance perovskite light-emitting diodes (PeLEDs). • This review examines both top-down and bottom-up techniques, such as photolithography and inkjet printing to achieve precise patterning of PeLEDs for full-color displays. • This review discusses critical challenges, including device stability, scalable manufacturing, and microscale pixel patterning, as well as promising strategies to overcome these obstacles for the commercialization of PeLEDs. • The review systematically categorizes fabrication methods into film deposition and patterning strategies, offering insights into scalable manufacturing and precision patterning for PeLEDs.
Abstract
Owing to the exceptional optoelectronic properties, metal halide perovskites have emerged as leading semiconductor materials for next-generation display technologies, providing perovskite light-emitting diodes (PeLEDs) great potential for high-quality color displays with a wide color gamut and pure color emission. Although laboratory-scale PeLEDs have achieved near-theoretical efficiencies, challenges such as achieving uniform large-area films, improving material stability, and enhancing patterning precision remain barriers to commercialization. This review presents a systematic analysis of scalable manufacturing and precision patterning strategies for PeLEDs, focusing on their applications in large-area lighting and full-color displays. Fabrication methods are categorized into film deposition techniques (spin-coating, blade-coating, and thermal evaporation) and patterning strategies, including top-down (photolithography, laser/e-beam lithography, and nanoimprinting) and bottom-up (patterned crystal growth, inkjet printing, and electrohydrodynamic jet printing) approaches. In this review, we discuss the advantages and limitations of each strategy, highlight current challenges, and outlook possible pathways towards scalable, high-performance PeLEDs for advanced optoelectronic applications.
1. Introduction
Metal halide perovskites (MHPs) are a class of emerging semiconductor materials with exceptional potential for next-generation optoelectronic technologies. The typical structure of MHPs follows the ABX₃ formula, where A represents monovalent cations (such as Cs⁺, Rb⁺, methylammonium (MA⁺), and formamidinium (FA⁺), B represents divalent metal cations (such as Sn²⁺ and Pb²⁺), and X denotes halide anions (such as Cl⁻, Br⁻, and I⁻) [1–6]. MHPs exhibit unique optoelectronic properties, primarily including high absorption coefficients, broad bandgap tunability, long carrier diffusion lengths, and excellent defect tolerance [7–9], which make them highly promising for a variety of applications, especially in the field of solar cells [10–15]. Over just a decade, perovskite solar cells (PSCs) have achieved impressive power conversion efficiencies (PCE) of 27.3% (perovskite single junction) [16], 33.89% (perovskite/silicon) [17], 29.1% (all perovskite tandem) [18], marking a significant breakthrough and driving forward the research and commercialization of MHP materials in the photovoltaic industry.
Perovskite light-emitting diodes (PeLEDs), a promising next-generation display technology, have also attracted widespread attention as the photovoltaic application. Compared to traditional liquid crystal displays (LCDs) and organic light-emitting diodes (OLEDs), PeLEDs offer numerous advantages, including narrower emission linewidths (15–20 nm), wide color gamuts, and high contrast ratios [5, 19–21]. These features enable PeLEDs to reach up to 140% of the national television system committee (NTSC) color standard, making them highly promising for applications in displays [3, 21, 22]. Moreover, the diverse chemical compositions of MHPs allow their optical properties to be highly tunable, enabling continuous spectral tuning from the blue-violet to near-infrared regions, further enhancing their appeal in optoelectronic applications [2, 3, 23, 24]. In 2014, Tan et al. [25] successfully demonstrated the first room-temperature green and near-infrared emitting PeLEDs, opening a new chapter in LED research. Since then, the performance of PeLEDs has rapidly improved.
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Shuaiqi Liu, Hao Jiang, Jizhuang Wang, Li Liu, Zhiwen Zhou, Mojun Chen (2026). Scalable Manufacturing and Precise Patterning of Perovskites for Light-Emitting Diodes. Nano-Micro Letters. https://doi.org/10.1007/s40820-025-02012-8
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Frequently Asked Questions
What are the main challenges for commercializing perovskite light-emitting diodes (PeLEDs)?
The main challenges include achieving uniform large-area films, improving material stability, and enhancing patterning precision, which are barriers to commercialization.
What fabrication techniques are reviewed for scalable manufacturing of PeLEDs?
The review covers film deposition techniques such as spin-coating, blade-coating, and thermal evaporation, as well as patterning strategies including top-down methods like photolithography and bottom-up methods like inkjet printing.
How do PeLEDs compare to traditional display technologies like OLEDs?
PeLEDs offer narrower emission linewidths (15–20 nm), wider color gamuts, and higher contrast ratios, enabling up to 140% of the NTSC color standard, making them highly promising for displays.
What are the potential applications of PeLEDs?
PeLEDs are promising for large-area lighting and full-color displays, leveraging their wide color gamut and pure color emission.
What is the significance of the review's categorization of fabrication methods?
The systematic categorization into film deposition and patterning strategies provides a comprehensive framework for understanding and advancing scalable manufacturing and precision patterning of PeLEDs.
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