• • As-deposited films are amorphous; coercivity decreases and saturation magnetization increases with thickness, stabilizing at 400 nm, which is optimal for device integration.
• • Annealing at 773 K and 873 K precipitates nanocrystalline α-Fe; exchange coupling between nanocrystals and amorphous matrix enhances soft magnetic properties.
• • Film annealed at 873 K for 30 min with heating rate 25 K/s achieves coercivity of 0.8 A/m and saturation magnetization of 1.45 T, enabling high-frequency operation with low eddy current losses.
• • Rapid thermal processing controls thermal gradient to produce smaller nanocrystals, reducing coercivity without additional transition metals, offering a cost-effective route for high-performance inductors.