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Official PDF TranslationSurface Technology (表面技术)

Experimental Study on Halbach Array-based Magnetic-field-assisted Shear Thickening Polishing of Zirconia Ceramics

Authors: ZHANG Yangyang; WANG Yingshuai; FENG Longlong; YUAN Yujie; LI Xiaojing; LIU Xiaofeng; HU Liang

DOI: 10.16490/j.cnki.issn.1001-3660.2026.09.008Status: Verified Translated Edition
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Key Findings in This Report

• • Halbach array with 11 permanent magnets generates a maximum magnetic induction of 192 mT and uniform central field distribution, with measured average of 150.2 mT, ensuring uniform force on ZrO2 during polishing and reducing edge defects. • • Magnetic shear thickening polishing slurry with 4% carbonyl iron powder at 150 mT exhibits the highest peak viscosity and broadest stable thickening range, optimizing the synergistic magnetorheological-shear thickening effect for enhanced material removal. • • Polishing speed increase raises shear rate and forms more abrasive-containing particle clusters, boosting MRR; excessive or insufficient polishing angle disrupts slurry flow, while workpiece rotation at moderate speed ensures uniform force but excessive rotation diverts slurry and weakens shear thickening. • • After 60 min of HMSTP, ZrO2 surface roughness Ra decreased from 601 nm to 11 nm and MRR reached 7.26 μm/h; compared to conventional STP without magnetic field, Ra reduced by 85.6% and MRR increased by 1.33 times, demonstrating significant industrial potential for high-efficiency, low-damage ceramic polishing.