• Al2O3 sorbents derived from hydrothermally synthesized AlOOH/CS at 120 °C exhibit superior reactivity for NF3 destructive sorption.
• Mn/Al2O3 sorbents, especially 5%Mn/Al2O3(160 °C), achieve a utilization percentage of 90.4%, surpassing all previously reported sorbents.
• The promotional effect of Mn2O3 surface layer enhances the fluorination of Al2O3 substrate, improving NF3 sorption efficiency.
• The study provides a novel hydrothermal method using urea as precipitant, offering a more efficient approach for NF3 abatement in semiconductor industry.