• Demonstrated room-temperature electrically injected GaN-based VCSEL using a conductive nanoporous DBR, overcoming the lack of p-type conductive DBRs.
• The nanoporous DBR provides both high reflectivity and electrical conductivity, enabling vertical current injection and simplified fabrication.
• Achieved continuous-wave lasing at room temperature with low threshold current, showcasing potential for high-density integration.
• The approach eliminates the need for complex flip-chip bonding or substrate thinning, improving device yield and thermal management.
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