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Effects of modulation layer thickness on microstructures and mechanical behavior of VN/TiN−Ni nano-multilayered films

Authors: Wen-jie CHENG; Ping LIU; Xin-fa ZHU; Yi MENG; Hong-mei LU; Peter K. LIAW; Wei LI

DOI: 10.1016/S1003-6326(25)66983-4Status: Verified Translated Edition
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Key Findings in This Report

• VN/TiN−Ni nano-multilayered films with a deposition time ratio of 10:12 achieve a hardness of 25.9 GPa, elastic modulus of 317 GPa, and fracture toughness of 1.88 MPa·m1/2. • Fracture toughness is improved by approximately 50% compared to monolithic VN films, attributed to coherent interfaces and phase separation in the TiN−Ni layer. • The TiN−Ni layer grows epitaxially on the VN layer, forming a coherent interface that enhances mechanical properties. • Modulation layer thickness critically influences the microstructure and mechanical behavior of the nano-multilayered films.