SinoTechIntel Academic Portal
Open AccessDOI: 10.1007/s11771-026-6182-9Original Research

An innovative design driven by contact performances for skiving of spur face gear drive with single cutter

TANG Zhong-wei¹,ZHOU Yuan-sheng¹,MO Shuai¹,TANG Jin-yuan¹,MA Chi¹,ZHANG Wu-ji¹,HE Hai-yu¹

College of Mechanical and Electrical Engineering, Central South University, Changsha 410083, China

Read Executive PreviewQuick FAQ
An innovative design driven by contact performances for skiving of spur face gear drive with single cutter
Graphical Abstract / Figure
Published In
Journal of Central South University
Published:January 15, 2026Edition:Vol. 33, Issue 1 • pp. 175-188Citation:TANG Zhong-wei et al. (2026), Journal of Central South University
Impact Factor4.4 (Q1 - Springer)
Sponsored Research Partner
Keywords & Index Terms:face gear drivesgear skivingload tooth contact analysiscontact performancescutter designsingle cutteroptimization

Key Takeaways & Executive Findings

  • • A novel contact performance-driven method enables skiving of both face gear and pinion with a single cutter, eliminating separate cutters and reducing costs. • The two-stage optimization model improves contact performance, reducing maximum tooth surface contact stress by 31.7% and avoiding edge contact. • Simulation and rolling tests confirm the consistency of tooth surface contact patterns, validating the method's effectiveness. • The proposed approach offers a practical reference for cutting edge design of skiving cutters for face gear drives.
Sponsored Research Highlight

Abstract

This study develops a contact performance-driven method for skiving face gear drives using a single cutter, eliminating the traditional need for separate cutters to reduce production costs and time. First, the mathematical models of the tooth flanks for the face gear drives are established based on the gear skiving processes. Then, load tooth contact analysis (LTCA) model is established to calculate the contact performance data. Next, a two-stage optimization model is employed to determine the optimal parameters of the cutting edge with improved contact performances. The effectiveness of this method is validated through simulations and rolling tests. Compared with the traditional method, the proposed method can machine both the face gear and its mating pinion with a single cutter. Simulation results show that the proposed method avoids tooth surface edge contact, with the maximum tooth surface contact stress reduced by 31.7%, the contact ratio decreases by 21.5%, and the transmission error increases by 22.3%. Rolling tests verify the consistency of tooth surface contact patterns between simulations and experiments. The proposed method provides a reference for the cutting edge design of skiving cutters for face gear pairs.

1. Introduction

Gear skiving technology was invented in 1910 [1], and it has become a highly competitive technology in manufacturing cylindrical gear, spline parts, and worm [2], as it can offer a superior surface finish and a high machining efficiency compared to other methods, such as hobbing [3], broaching, and shaping [4].

The cutting edge design of the gear skiving cutter is the key to determining the machining accuracy. However, the skiving cutter's inherent errors and the cutting edge's longitudinal deviation contribute to the gear profile's inaccuracies [5]. This makes it difficult to achieve high-precision skiving of gears, especially for some gears with complex geometric tooth surfaces, such as face gears and bevel gears. To address this, academia has proposed solutions: 1) optimizing the cutting-edge of skiving tool and, 2) optimizing the cutting path to compensate for tooth surface errors.

SinoTechIntel Interactive Document Reader
Page 1–5 of Preview
100%
Download Full PDF

Loading authentic research manuscript (Pages 1–5)...

Sponsored Research Partner
Cite This Research Paper
TANG Zhong-wei, ZHOU Yuan-sheng, MO Shuai, TANG Jin-yuan, MA Chi, ZHANG Wu-ji, HE Hai-yu (2026). An innovative design driven by contact performances for skiving of spur face gear drive with single cutter. Journal of Central South University. https://doi.org/10.1007/s11771-026-6182-9
SinoTechIntel Academic & Legal Disclaimer

Research & Educational Purpose Only:The translations, structured abstracts, analytical annotations, and data reports provided by SinoTechIntel are intended exclusively for academic research, internal corporate R&D, and educational benchmarking. They do not constitute formal engineering, chemical safety, legal, or professional advice.

Copyright & Intellectual Property Notice: Original copyright of the underlying source articles and experimental data remains with the respective authors, institutions, and original publishing journals. SinoTechIntel claims intellectual property only over its proprietary translations, analytical syntheses, and AEO structured enhancements in accordance with international fair use and academic citation principles.

Frequently Asked Questions

What is the main innovation of this paper?

The paper proposes a contact performance-driven method for skiving face gear drives using a single cutter, eliminating the need for separate cutters for the gear and pinion, thus reducing production costs and time.

How does the proposed method improve contact performance?

The method uses a two-stage optimization model to determine optimal cutting edge parameters, which reduces maximum tooth surface contact stress by 31.7%, avoids edge contact, and maintains consistent contact patterns as verified by rolling tests.

What are the key simulation results?

Simulation results show that the proposed method avoids tooth surface edge contact, reduces maximum contact stress by 31.7%, decreases contact ratio by 21.5%, and increases transmission error by 22.3% compared to traditional methods.

How is the method validated?

The method is validated through both simulations and rolling tests, which confirm the consistency of tooth surface contact patterns between simulations and experiments.

What is the significance of this work for gear manufacturing?

This work provides a reference for cutting edge design of skiving cutters for face gear pairs, enabling efficient and cost-effective production of high-quality face gear drives.

Recommended Scientific Literature & Research Partners

Related Technical Papers & Translations

Research Paper
Direct Repair of the Crystal Structure and Coating Surface of Spent LiFePO4 Materials Enables Superfast Li-Ion Migration

Direct Repair of the Crystal Structure and Coating Surface of Spent LiFePO4 Materials Enables Superfast Li-Ion Migration

The rapid accumulation of spent LiFePO4 (LFP) cathodes from retired lithium-ion batteries necessitates the development of effective and environmental-friendly recycling strategies. In this context, direct regeneration has emerged as a promising approach for reclaiming LFP cathode materials, offering a streamlined pathway to restore their electrochemical functionality. We report an integrated regeneration protocol that simultaneously repairs the degraded crystal structure and reconstructs the damaged carbon coating in spent LFP. The regenerated cathode material had superfast lithium-ion diffusion kinetics and a stable cathode–electrolyte interface, giving a remarkable rate capability with specific capacities of 122 mAh g−1 at 5C and 106 mAh g−1 at 10C (1C = 170 mA g−1). It also maintained capacities of 110.7 mAh g−1 (5C) and 84.1 mAh g−1 (10C) after 400 cycles. It could be used in harsh environments and could be stably cycled at subzero temperatures (−10 and −20 °C) and in solid-state electrolyte batteries. Life cycle assessment combined with economic evaluation using the EverBatt model reveals that this direct regeneration approach has high economic and environmental benefits.

Read Abstract & PDF
Research Paper
Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges

Oxide Semiconductor for Advanced Memory Architectures: Atomic Layer Deposition, Key Requirement and Challenges

Oxide semiconductors (OSs), introduced by the Hosono group in the early 2000s, have evolved from display backplane materials to promising candidates for advanced memory and logic devices. The exceptionally low leakage current of OSs and compatibility with three-dimensional (3D) architectures have recently sparked renewed interest in their use in semiconductor applications. This review begins by exploring the unique material properties of OSs, which fundamentally originate from their distinct electronic band structure. Subsequently, we focus on atomic layer deposition (ALD), a core technique for growing excellent OS films, covering both basic and advanced processes compatible with 3D scaling. The basic surface reaction mechanisms—adsorption and reaction—and their roles in film growth are introduced. Furthermore, material design strategies, such as cation selection, crystallinity control, anion doping, and heterostructure engineering, are discussed. We also highlight challenges in memory applications, including contact resistance, hydrogen instability, and lack of p-type materials, and discuss the feasibility of ALD-grown OSs as potential solutions. Lastly, we provide an outlook on the role of ALD-grown OSs in memory technologies. This review bridges material fundamentals and device-level requirements, offering a comprehensive perspective on the potential of ALD-driven OSs for next-generation semiconductor memory devices.

Read Abstract & PDF
Research Paper
Laser powder bed fusion of biodegradable Zn-4Cu alloy: Processing, microstructure and properties

Laser powder bed fusion of biodegradable Zn-4Cu alloy: Processing, microstructure and properties

Zn's natural degradability and biocompatibility make it a promising candidate for implants, however, its mechanical properties remain insufficient for bone applications. In this study, the performance of Zn was enhanced by developing Zn-Cu alloys via laser powder bed fusion (LPBF). Optimal LPBF parameters for forming stable tracks were achieved by adjusting laser power and scanning speed. Under optimized conditions of 100 W and 100 mm/s, high-density (99.58%) Zn-Cu alloys with improved hardness (68.2HV) and yield strength (160 MPa) were achieved. These improvements are attributed to solid solution strengthening, segregation strengthening, and grain refinement. The Zn-Cu alloys also demonstrated favorable degradation behavior, with a rate of 0.16 mm/year. This degradation is primarily driven by micro-galvanic corrosion between the CuZn5 phase and Zn matrix, along with refined grains and increased grain boundary density. This work demonstrates a viable strategy for fabricating Zn-based implants with enhanced structural integrity and mechanical performance via LPBF.

Read Abstract & PDF